The self-annealing phenomenon of electrodeposited nano-twin copper with high defect density

Han, Haneul and Lee, Chaerin and Kim, Youjung and Lee, Jinhyun and Yoon, Sanghwa and Yoo, Bongyoung (2022) The self-annealing phenomenon of electrodeposited nano-twin copper with high defect density. Frontiers in Chemistry, 10. ISSN 2296-2646

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Abstract

Electroplated copper was prepared under typical conditions and a high defect density to study the effect of the defects on its self-annealing phenomenon. Two conditions, grain growth and stress relaxation during self-annealing, were analyzed with electron backscattered diffraction and a high-resolution X-ray diffractometer. Abnormal grain growth was observed in both conditions; however, the grown crystal orientation differed. The direction and relative rate at which abnormal grain growth proceeds were specified through textured orientation, and the self-annealing mechanism was studied by observing the residual stress changes over time in the films using the sin2Ψ method.

Item Type: Article
Subjects: STM Library > Chemical Science
Depositing User: Managing Editor
Date Deposited: 25 Jan 2023 05:30
Last Modified: 12 Mar 2024 04:08
URI: http://open.journal4submit.com/id/eprint/950

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